Resist Spray Coater RS-C810A
The RS-C810A resist spray coater employs a
spray system incorporated within the coating
process to coat the surface of the wafer with
both positive and negative resist.
Features
- 1.Thick coating (>100 μm) even with low viscosity resist
- 2.Thorough coating of stepped wafer edges
- 3.No striation in the wafer coating
- 4.Reduced resist swell at the wafer edge
- 5.Handles a wider variety and shapes of wafers(square, etc.).
- 6.Uses less resist compared with spin coaters
- 7.Solutions other than resist can be used
Specification
| Model | RS-C810A |
|---|---|
| Target object | Wafers (SEMI Standard) |
| Wafer size | Φ4 to Φ8 inches |
| Processing method | Single wafer process (using 25-wafer cassette) |
| Processing system | Spray coating with resist |
| Acceptable resist | Our recommended resist, etc |
| Dimensions (WxDxH) | 1,940 x 1,300 x H:1,900 mm |
| Weight | Approx. 1,500 kg |
Basic performance
| Throughput | 30 wafers/hr ※Under normal 5-inch standard processing conditions |
|---|---|
| Resist film thickness uniformity | 3σ/Ave ≦10％ ※Bear wafer, film thickness ≧ 10μm |
RS-C810L, a compact-size coater for labs
The RS-C810L, a compact-size
coater for labs, is also available.
Features
- Best suited for R&D and small-lot production.
- Can process Φ4- to Φ8-inch wafers as well with the optional stage unit.
- Carrier and HP/CP/Backrinse not included.
